A non-destructive, fast evaluation of PVD diffusion barriers deposited on porous low-k dielectrics

A non-destructive, fast evaluation of PVD diffusion barriers deposited on porous low-k dielectrics

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 198, 15 October 2018, Pages 22-28

Yingjie Wang, Peng He, Jing Zhang, Jiang Yan, Dmitry V. Lopaev, Xin-Ping Qu, Mikhail R. Baklanov,