FOUP decontamination solutions to control AMCs in semiconductor fabs: Gas purge or wet cleaning?

FOUP decontamination solutions to control AMCs in semiconductor fabs: Gas purge or wet cleaning?

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 194, 5 July 2018, Pages 19-24

P. González-Aguirre, H. Fontaine, S.I. Moon, C. Beitia, J. Lundgren, J. Ohlsen,