Centrifuge-aided micromolding of micron- and submicron-sized patterns

Developed from soft lithography, replica molding has been proven to be a good method to prepare micron- and submicron-sized features. However, the fidelity of the features can be compromised by incomplete feature cavity filling and feature shrinkage during the forming process. In this study, centrifuge-aided micromolding is developed to prepare micron- and submicron-sized ZnO features. By introducing a centrifugal force, the shear-thinning behavior of the suspensions is utilized, and the cavity filling process and the diffusion of trapped air out of the features are accelerated. The drying shrinkage is decreased by increasing the density of the wet nanoparticle packing from the centrifugal process. The centrifugal force improves the fidelity of all the designed features. ZnO ridges from 0.4 μm to 2 μm size and rods of 1.6 μm size are prepared successfully. The wide applicability of this strategy has been demonstrated by preparing ZrO2 features via the same method.