Rapid and localized ion-beam etching of surfaces using initial notches

Using an ultrashort-pulsed solid-state laser, notches were created on (100)-Si substrates. Due to the local change in surface inclination, preferential erosion took place behind the notches upon subsequent ion beam etching at glancing angles. As a consequence, a terrace structure possessing a well-defined jump in surface height was formed. The surface topography and its evolution dynamics were characterized and the findings compared to numerical simulations based on a deterministic, two-dimensional model. On this basis, a workflow utilizing these initial notches (iNotches™) for the preparation of an electron transparent lamella was realized and TEM micrographs of the prepared sample were taken.