Enhanced surface hardness of flexible polycarbonate substrates using plasma-polymerized organosilicon oxynitride films by air plasma jet under atmospheric pressure

►Organic-inorganic hybrid SiOxCyNz films produced by an APPJ with TMDSO precursor. ►Flexible, transparent and hard PC/SiOxCyNz formed using air plasma jet. ►Higher chemical bonds Si―(O)4 and (R)1―Si―(O)3 offer higher surface hardness. ►Higher deposition rate results in lower proportion of grain boundary. ►Lower proportion of grain boundary provides smoother surface.