Size-controlled formation of Cu nanoclusters in pulsed magnetron sputtering system

► Pulsed magnetron sputtering was used for size-controlled deposition of Cu clusters. ► Size of the clusters can be controlled by the frequency and duty cycle of pulses. ► Size of deposited clusters is observed about 105 amu and /or 8-10 nm in diameter. ► The cluster mass flux is not dependent on frequency or duty cycle.