Tribological and oxidation behaviour of TiAlCN/VCN nanoscale multilayer coating deposited by the combined HIPIMS/(HIPIMS-UBM) technique

►High Me+ bombardment be achieved during HIPIMS etching leads to high adhesion. ►HIPIMS for TiAlCN deposition has shown more metal/gas ion ratio (1:7) than UBMS (1:32). ►High metal ion bombardment leads to a very dense coating (no inter-columnar voids). ►The HIPIMS deposited TiAlCN/VCN coating shows high oxidation resistance (≅ 800 °C).