DC-MSIP/HPPMS (Cr,Al,V)N and (Cr,Al,W)N thin films for high-temperature friction reduction

► High hardness and high deposition rate by using the hybrid DC-MSIP/HPPMS PVD process ► Temperature activation of vanadium containing (Cr,Al)N based coatings ► Activated (Cr,Al,V)N leads to friction reduction at elevated temperatures ► Diffusion of V through the (Cr,Al)N matrix and generation of friction-reducing oxides