Study on the edge isolation of industrial silicon solar cells with waterjet-guided laser

In this paper, we review the device physics to explain the necessity of edge isolation as well as the various common methods for performing this important step. In order to assess these processes, different aspects have to be taken into consideration and will be discussed. Finally, experimental results of edge isolation on commercial multicrystalline solar cells with waterjet-guided laser (wavelength 1064 nm) and conventional laser (wavelength 355 nm) are presented and discussed. From the experiments, we conclude that the waterjet-guided laser shows the potential to improve the laser scribing process in terms of pn junction damage and mechanical stability.