کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9670457 | 1450403 | 2005 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
The characterization of stacked α-Si/SiGe/α-Si sensing membrane
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
In this work, the stacked α-Si/SiGe/α-Si film was first used as ion sensing membrane of Electrolyte-Insulator-Semiconductor. All sensing membranes were deposited in low pressure chemical vapor deposition with GeH4 and Si2H6 mixtures. Comparing to α-Si sensing membrane, the characteristics of the α-Si/SiGe/α-Si sensing membrane were studied including pH sensitivity and drift phenomena. The pH sensitivity of α-Si/SiGe/α-Si and α-Si EIS was 83.1 ± 2.1 and 76.8 ± 2.2mV/pH, respectively. However, the drift voltage was a little large and resulted in the unstable sensitivity. A physical model was proposed for the unstable sensitivity phenomena. This unstable phenomenon was eliminated by baking treatment.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 80, 17 June 2005, Pages 46-49
Journal: Microelectronic Engineering - Volume 80, 17 June 2005, Pages 46-49
نویسندگان
Chia-Ming Yang, Chao-Sung Lai, Chih-Yao Wang, Cheng-En Lue, Jung-Chung Chou, Wen-Yaw Chung, Dorota G. Pijanowska,