کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
9670472 1450403 2005 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Intrinsic band edge traps in nano-crystalline HfO2 gate dielectrics
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Intrinsic band edge traps in nano-crystalline HfO2 gate dielectrics
چکیده انگلیسی
Chemically pure thin films of HfO2, as well as other transition metal and rare earth elemental and complex oxides, e.g., LaScO3 and LaAlO3, are nanocrystalline as-deposited. The local bonding environments of the transition and rare earth atoms are distorted with respect to ideal octahedral or cubic bonding, and degeneracies of the respective band edge d-states are completely removed by Jahn-Teller (J-T) distortions. Spectroscopic studies have revealed these J-T term splittings, and also a band edge localized state which is assigned to an electronically-active bonding defect at nanocrystalline grain boundaries.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 80, 17 June 2005, Pages 110-113
نویسندگان
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