Keywords: Plasma-wall interaction; Tungsten nitride; XPS quantification; Bayesian statistics; Sputter depth profiling; SDTrimSp; Ion-induced atom mobilisation; 28.52.Fa; 52.40.Hf; 79.20.Rf; 79.60.Dp;
مقالات ISI (ترجمه نشده)
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Keywords: 81.16.Rf; 79.20.Rf; Ru; Si; Metallic glass; Ion beam sputtering; Nano patterning;
Keywords: Silicon; Ion beam sputtering; Solid flow; Atomic force microscopy; 79.20.Rf; 81.07.âb; 07.79.Lh;
Keywords: Ion sputtering; RAFM steel; Plasma-material interactions52.40Hf; 28.52.Fa; 68.49Sf; 79.20.Rf
The retarding Bessel-Box-An electron-spectrometer designed for pump/probe experiments
Keywords: Electron spectrometer; Detection-solid-angle; Energy resolution; Femtosecond-pump/probe experiments; Photo electrons; Auger electrons; 79.20.Rf; 71.20.Ps; 31.70.Hq; 32.80.Hd; 61.80.Jh;
Secondary ion mass spectrometry and photoluminescence study on microstructural characteristics of chemically synthesized ZnO nanowalls
Keywords: 78.55.Et; 78.67.ân; 79.20.Rf; 68.49.Sf; ZnO; Nanostructures; Photoluminescence; Secondary ion mass spectrometry;
Growth process of GaAs ripples as a function of incident Ar-ion dose
Keywords: 68.35.Bs; 79.20.Rf; 64.60.Ht; Gallium Arsenide; Ripple morphology; Atomic Force Microscopy; Sputter-induced nanopattern;
Self-organization of ripples on Ti irradiated with focused ion beam
Keywords: 79.20.Rf; 68.35.Fx; 81.65.Cf; Ripple; Focused ion beam; Ti; Surface diffusion;
White light interferometry for quantitative surface characterization in ion sputtering experiments
Keywords: 06.30.Bp; 07.60.Ly; 61.80.Jh; 79.20.Rf; White light interferometry; Ion sputtering; Depth profiling; Mass spectrometry; Genesis;
Ripple topography on thin ZnO films by grazing and oblique incidence ion sputtering
Keywords: 61.80.Jh; 81.16.âc; 79.20.Rf; 81.16.Rf; 79.20.Ap; Sputtering; Ripple; Grazing incidence; ZnO;
Quantitative relation between the thermionic contrast of metal surfaces and their degree of monocrystallization
Keywords: 73.30.+y; 79.20.Rf; Effective work function; Thermionic contrast; Monocrystallization degree; Local work function; Positive ion emission; Electron emission;
Ion-induced secondary electron emission from ZnS thin films deposited by closed-spaced sublimation
Keywords: 78.20.Ci; 78.66.âw; 78.66.Hf; 79.20.Rf; 79.20.Ap; ZnS films; Energy band gap; Ion-induced electron emission; Monte Carlo simulation;
A 3D-RBS study of irradiation-induced deformation and masking properties of ordered colloidal nanoparticulate masks
Keywords: 61.46.Df; 79.20.Rf; 81.16.Nd; 82.80.Yc3D-RBS; Nanosphere lithography; Ion irradiation; Anisotropic deformation
X-ray photoelectron spectroscopy study of NiSi formation on shallow junctions
Keywords: 85.40.Ls; 82.80.Pv; 79.20.Rf; 68.35.Dv; NiSi; XPS; Dopant segregation; Preferred sputtering;
Effect of H+ irradiation on the optical properties of vacuum evaporated AgInSe2 thin films
Keywords: 29.20.Ej; 61.05.cp; 78.40.Fy; 79.20.Rf; Thin film; X-ray diffraction; Ion beam technology; Optical properties;
Ion-induced electron emission monitoring of the structure and morphology evolution in HOPG
Keywords: 79.20.âm; 79.20.Rf; High-fluence ion irradiation; Ion-induced electron emission; Radiation damage in carbon-based materials;
Cluster size dependence of SiO2 thin film formation by O2 gas cluster ion beams
Keywords: 29.27.Fh; 36.40.Jn; 79.20.Rf; Gas cluster ion beam; Cluster size; Thin film;
Modification and smoothing of patterned surface by gas cluster ion beam irradiation
Keywords: 07.77+p; 79.20.Rf; 81.65.Cf; GCIB; Surface smoothing; Patterned surface;
Investigation of an ion-milled Si/Cr multilayer using micro-RBS, ellipsometry and AES depth profiling techniques
Keywords: 68.65.Ac; 79.20.Rf; 82.80.Pv; 82.80.Yc; 07.60.FsMultilayer; Ion beam milling; Ellipsometry; AES; Depth profiling; RBS; Tomography
Aperture edge scattering in focused MeV ion beam lithography and nuclear microscopy: An application for the GEANT4 toolkit
Keywords: 24.10.Lx; 41.85.Si; 41.85.Ja; 68.49.Sf; 79.20.Rf; 87.56.−JMeV ion scattering; Monte-Carlo; Edge scattering; GEANT4; Aperture; Slit
Study on the ablation modification effects for EB-PVD ceramic coatings considering the microstructure of the surface
Keywords: 61.80.Jh; 79.20.Rf; High-intensity pulsed ion beam; Ceramic; Temperature field; Ablation modification;
Molecular simulations of cluster ejection by CO2 cluster impact on carbon-based surfaces
Keywords: 79.20.Rf; 79.20.AP; 61.80.Lj; Cluster impact; Carbon-based surface; Reactive sputtering; Collision cascade;
Monte Carlo study of ion-induced secondary electron emission from SiO2
Keywords: 79.20.Rf; 79.20.Ap; Ion-induced electron emission; Monte Carlo simulation; SiO2;
Surface segregation of Ti atoms during NiTi alloy sputtering
Keywords: 61.82.Bg; 79.20.Ap; 79.20.Rf; Sputtering; Angular distribution; Surface segregation; NiTi alloy; Computer simulation;
Sputtering induced by cluster impact on metal targets: Influenceof electronic stopping
Keywords: 79.20.Rf; 79.20.Ap; 61.80.Lj; 34.50.BwCluster impact; Molecular-dynamics simulation; Electronic stopping; Spike effects
Evolution of ion-induced ripple patterns on SiO2 surfaces
Keywords: 68.37.Ps; 79.20.Rf; 81.16.Rf; 81.65.CfNanopatterning; Ion sputtering; Amorphization; AFM
Study of carbon dust formation and their structure using inductively coupled plasmas under high atomic hydrogen irradiation
Keywords: 52.40.Hf; 81.05.Uw; 81.15.Cd; 79.20.Rf
Evaluation of radiation damages on the first-wall surface in LHD exposed to charge-exchanged helium particles
Keywords: 52.40.Hf; 25.60.Lg; 52.55.−s; 87.64.Ee; 79.20.Rf
Morphology of Si surfaces sputter-eroded by low-energy Xe-ions at glancing incident angle
Keywords: 68.35.Bs; 79.20.Rf; 61.80JhSurface structure and topography; Sputtering; Ion-beam erosion; Si
Tracks of 30-MeV C60 clusters in yttrium iron garnet studied by scanning force microscopy
Keywords: 61.80.Jh; 68.37.Ps; 79.20.Rf; Ion tracks; Y3Fe5O12; Clusters; Energy loss; SFM;
Surfactant Sputtering: Theory of a new method of surface nanostructuring by ion beams
Keywords: 68.55.a; 68.35.Ct; 05.45.a; 79.20.Rf; 81.16.Rf; Ion-beam sputtering; Pattern formation; Surfactant sputtering; Continuum theory; Monte Carlo method;
Sputtering of thin benzene films by large noble gas clusters
Keywords: 83.10.Rs; 82.80.Ms; 79.20.Rf; Molecular dynamics; SIMS; Sputtering; Cluster projectiles; Organic overlayers;
Damage analysis of benzene induced by keV fullerene bombardment
Keywords: 79.20.Rf; 82.80.Ms; 81.70.Jb; 83.10.Rs; Sputtering; SIMS/SNMS; Depth profiling; Molecular dynamics computer simulations; Cluster projectiles; Organic material;
Assessment of swift-ion damage by RBS/C: Determination of the amorphization threshold
Keywords: 61.80.Az; 61.80.Jh; 79.20.Rf; 34.50.Fa; Damage; Excitons; Ion-beams; Thermal spike; RBS/C; Channeling; Amorphization threshold;
Effect of spin polarization of Ni(1Â 1Â 0) surface on Auger neutralization for grazing scattering of He+ ions
Keywords: 79.20.Rf; 34.35.+al; 75.70.âi; Ion-surface interaction; Ni(1Â 1Â 0); Helium; Charge transfer; Auger neutralization; Surface magnetism; Thermal displacements; Grazing scattering;
Electron excitations in grazing diffraction of fast He on a Ag(1Â 1Â 0) surface. A tribute to Hannspeter Winter
Keywords: 79.20.Rf; 73.20.At; 34.20.Cf; 34.50.Bw; Energy loss; Stopping power; Fast atom diffraction;
On the origin of the LEIS signal in TOF- and in ESA-LEIS
Keywords: 34.50.Dy; 68.49.Sf; 79.20.Rf; Low-energy ion scattering; Time-of-flight; Electrostatic analyzer; Single crystal; Neutralization; Reionization; Cu(1Â 0Â 0); Ion fraction;
Molecular dynamics simulations to explore the effect of chemical bonding in the keV bombardment of Si with C60, Ne60 and 12Ne60 projectiles
Keywords: 68.49.Sf; 61.80.Jh; 79.20.Ap; 79.20.Rf; Molecular dynamics; MEDF; C60; Silicon;
Determination of trace metals in cow's milk from waste water irrigated areas in Central Mexico by chemical treatment coupled to PIXE
Keywords: 07.88.+y; 82.80.-d; 79.20.Rf; 32.30.RjMilk; Trace metals; Polluted area; APDC; PIXE
Imaging dynamics of charge-auto-organisation in glass capillaries
Keywords: 34.70.+e; 49.85.âp; 61.89.+p; 68.49.âh; 79.20.Rf; 81.07.De; Micro-beam; Highly-charged ions; Guiding effect; Self-organization; Ion-insulator interaction; Glass capillaries; Ion-surface interaction;
PIXE–PIGE analysis of Carolingian period glass from Slovenia
Keywords: 82.80.Ej; 79.20.Rf; 81.05.KfPIXE; PIGE; Glass; Natron; Late Roman; Carolingian
The emission process of secondary ions from solids bombarded with large gas cluster ions
Keywords: 79.20.âm; 79.20.Rf; Ar cluster; TOF; Si; Secondary ion; Si cluster;
Incidence-angle dependent Cs incorporation in Si during low-energy bombardment: A dynamic computer simulation study
Keywords: 79.20.Rf; 61.72.âU; 61.80.Jh; 02.70.Uu; Cs irradiation; Computer simulation; Silicon; Sputtering;
Forward–backward correlation in secondary electron emission from a thin carbon foil by frozen-charged H+H+ and H0H0 penetration
Keywords: 79.20.Rf; 34.50.Bw; 34.50.FaSecondary electron; Emission statistics; Frozen-charge; Forward–backward correlation
Dynamic dependence of the interaction potentials for grazing scattering of fast atoms from metal and insulator surfaces
Keywords: 79.20.Rf; 34.20.Cf; 34.35.+aInteratomic potential; Fast atom scattering; Surface channeling
Electron emission from tungsten induced by slow, fusion-relevant ions
Keywords: 34.50.Dy; 79.20.Rf; Electron emission; Ion-surface interaction; Plasma-wall-interaction; Tungsten;
Sputtering of cryogenic films of hydrogen by keV ions: Thickness dependence and surface morphology
Keywords: 79.20.Rf; 67.80.−F; 68.55.−aSputtering; Solid hydrogen; Low temperature; Growth of films
Cluster-induced sputtering of molecular targets
Keywords: 79.20.Ap; 61.80.Az; 61.80.Lj; 79.20.Rf; Cluster impact; Molecular-dynamics simulation; Sputtering; Crater formation; Energy distribution; Dissociation; Reaction;
Effect of adsorbates on the formation of doubly excited He atoms during impact of He2+ ions on a Ni(1Â 1Â 0) surface
Keywords: 79.20.Rf; 34.35.+a; 75.70.âi; Ni(1Â 1Â 0); Electron emission; Charge transfer; Oxygen adsorption; Helium autoionization;
Competition of terrace and step-edge sputtering under oblique-incidence ion impact on a stepped Pt(1 1 1) surface
Keywords: 61.80.Jh; 79.20.Rf; 68.49.SfSputtering; Molecular-dynamics simulation; Ion reflection