Interface and stability analysis of Tantalum- and Titanium nitride thin films onto Lithiumniobate

In this context, we present results of detailed chemical interface analysis of sputtered TaN and TiN thin films as potential barrier layers onto SAW-substrate material (LiNbO3) with respect to their temporal (up to 8 h) and thermal stability up to 600 °C in vacuum. We report good stability of both systems. The main technique for analysis was non-destructive and surface sensitive angle-resolved X-ray photoelectron spectroscopy (AR-XPS).