Production and characterization of TeIx (x: 2, 4) thin films: Optical, structural properties and effect of porosity

• TeIx thin films were produced with chemical bath deposition with different iodine concentrations.
• Optical band gap increased with concentration of iodine between 3.72 to 3.90 eV.
• The film thickness changed with concentration of iodine from 237 nm to 866 nm.

Within the scope of the study, tellurium iodide (TeIx) crystalline thin film was produced via chemical bath deposition on substrates (commercial glass). Transmittance, absorption, optical band gap and refractive index were examined by Ultra violet/visible spectroscopy. X-ray diffraction revealed that the structure was hexagonal. Structural and optical properties of TeIx thin films, produced at different iodine concentrations were analyzed. Scanning electron microscope was used for surface analysis, whereas electron microscope analysis was used to determine the elemental ratio in the films. It has been found that characteristics of the films, such as structure, porosity, average grain size, number of crystalline per unit area etc., were changed with iodine concentration. Iodine concentration has varied between 2.5 × 10− 3 and 10 × 10− 3 M. Optical band gap has been increased with iodine concentration, taking values between 3.72 to 3.90 eV. Also, film thickness has been changed from 237 nm to 866 nm, according to iodine concentration. In addition, the effect of porosity on structural properties of thin films was investigated.

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