The effect of the oxygen concentration and the rf power on the zinc oxide films properties deposited by magnetron sputtering

Crystalline structures and roughness characteristics of the films were investigated by X-ray diffraction (XRD) and atomic force microscopy (AFM) measurements, respectively. Deposition conditions were optimized to obtain films of good quality suitable for the fabrication of surface acoustic wave (SAW) devices. The optimal parameters to obtain a good piezoelectric material have been: rf power 50 W and reactive plasma.