Preparation of silicon-doped diamond-like carbon films with electrical conductivity by reactive high-power impulse magnetron sputtering combined with a plasma-based ion implantation system

Preparation of silicon-doped diamond-like carbon films with electrical conductivity by reactive high-power impulse magnetron sputtering combined with a plasma-based ion implantation system

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Diamond and Related Materials - Volume 101, January 2020, 107635

Yuki Shibata, Takashi Kimura, Setsuo Nakao, Kingo Azuma,