Reactive deposition of cobalt using bis(2,2,6,6-tetramethyl-3,5-heptanedionato) cobalt(II) from supercritical carbon dioxide

- Cobalt depositions were conducted on native oxide Si, TaN, Cu and carbon in scCO2.
- Bis(2,2,6,6-tetramethyl-3,5-heptanedionato) cobalt(II) was used as the precursor.
- High purity cobalt thin films were obtained onto TaN at temperature above 300 °C.
- Cobalt films could also be deposited on both Cu and carbon surfaces.
- Antioxidation tests of copper coated with cobalt were carried out in water and air.