کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
10267001 459433 2005 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Electrodeposition of platinum metal on TiN thin films
موضوعات مرتبط
مهندسی و علوم پایه مهندسی شیمی مهندسی شیمی (عمومی)
پیش نمایش صفحه اول مقاله
Electrodeposition of platinum metal on TiN thin films
چکیده انگلیسی
Electrodeposition of platinum metal from a chloride-based platinum electroplating bath at 35 °C onto high quality titanium nitride electrodes produced by standard microfabrication techniques has been demonstrated and characterised using electrochemical methods and scanning electron microscopy. When using a relatively simple two potential step electroplating procedure, it is possible to produce good quality deposits which are both adherent and metallic in appearance, without the need for electrode pre-treatment. Cyclic voltammetric analysis of these electrodeposited Pt/TiN films in dilute sulfuric acid yields voltammograms with features characteristic of bulk polycrystalline platinum electrodes. Voltammetry in potassium ferricyanide yields reversible voltammograms, indicating the good electrical conductivity of and connectivity between the deposited Pt and the TiN substrate and hence the absence of any significant resistive surface titanium dioxide or oxynitride film. This process is compatible with the production of platinum array electrodes, which can be integrated with silicon based microelectronic circuitry to produce array based sensors and biosensors.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Electrochemistry Communications - Volume 7, Issue 2, February 2005, Pages 125-129
نویسندگان
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