کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1193047 1492258 2014 9 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Sub-eV ion deposition utilizing soft-landing ion mobility for controlled ion, ion cluster, and charged nanoparticle deposition
ترجمه فارسی عنوان
رسوب یون فرعی با استفاده از تحرک یون نرم برای یون های کنترل شده، خوشه یون و رسوب نانو ذرات شارژ
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی آنالیزی یا شیمی تجزیه
چکیده انگلیسی


• Controlled ion deposition using soft-landing ion mobility for a variety of applications.
• Soft-landing hafnium oxide onto graphene has enabled the production of p-type material.
• The use of soft-landed silver nanoparticles for MALDI and SERS analysis.

Sub-eV ion deposition via soft-landing ion mobility has been utilized for a variety of applications. It has allowed for the deposition of a dielectric material onto graphene without introducing defects into the lattice structure. This deposition technique has also been used for surface enhanced Raman studies. Deposited silver has also been used as an alternative MALDI matrix for low mass compounds and shows promise for imaging applications.

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ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: International Journal of Mass Spectrometry - Volume 370, 15 September 2014, Pages 66–74
نویسندگان
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