کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1228112 | 968447 | 2010 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Bias-current modulation technique of a radio-frequency glow discharge plasma for atomic emission analysis associated with a fast Fourier transform analyzer
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی آنالیزی یا شیمی تجزیه
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Bias-current modulation technique of a radio-frequency glow discharge plasma for atomic emission analysis associated with a fast Fourier transform analyzer Bias-current modulation technique of a radio-frequency glow discharge plasma for atomic emission analysis associated with a fast Fourier transform analyzer](/preview/png/1228112.png)
چکیده انگلیسی
A measuring method using a fast Fourier transform (FFT) analyzer is suggested to estimate the emission intensity from a radio-frequency (RF)-powered glow discharge plasma for atomic emission analysis. The FFT analyzer has an ability to disperse the components by frequency from an overall signal, and thus works as a selective detector in modulation spectroscopy. In the RF glow discharge plasma, a dc bias current can be introduced by connecting an external electric circuit with the discharge lamp, which predominantly enhances the emission intensities. Further, the bias current can be pulsated with a switching device to modulate the emission intensities, and then the modulated component was selectively detected with the FFT analyzer. This method greatly improved the data precision. The emission intensity of the Cu I 324.75-nm line in an Fe-based alloy sample containing 0.043 mass% Cu could be estimated with a relative standard deviation of 0.20%. The 3Ï detection limits of Cu in Fe-based alloys could be obtained to be 2.3 Ã 10â 6 mass% Cu for Cu I 324.75 nm and 6.8 Ã 10â 6 mass% Cu for Cu I 327.40 nm.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microchemical Journal - Volume 95, Issue 1, May 2010, Pages 107-112
Journal: Microchemical Journal - Volume 95, Issue 1, May 2010, Pages 107-112
نویسندگان
Kazuaki Wagatsuma, Satomi Urushibata,