کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1513328 | 1511214 | 2012 | 11 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Laser Chemical Metal Deposition for Silicon Solar Cell Metallization
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی انرژی
انرژی (عمومی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
This work describes the development of the Laser Chemical Metal Deposition (LCMD) process for silicon solar cell metallisation. The LCMD process can be considered as an advanced and promising method for solar cell metallisation. With LCMD a metal seed layer is created on the surface of a silicon wafer. Subsequently, the seed layer is thickened by a plating process. It is a low temperature metallisation scheme that does not need any additional masking processes. In this work different nickel solutions and laser configurations were analyzed. Variations of laser power, repetition number and scan speed were performed and the resulting contacts were characterized. With the optimized parameters, silicon solar cells with efficiencies up to 17.9% have been processed and demonstrate the great potential of LCMD.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Energy Procedia - Volume 21, 2012, Pages 47-57
Journal: Energy Procedia - Volume 21, 2012, Pages 47-57
نویسندگان
N. Wehkamp, A. Fell, J. Bartsch, F. Granek,