Transparent and conductive ZnO thin films doped with V

Influence of the vanadium concentrations, CV, on the structural, optical and electrical properties of V doped ZnO thin films deposited by R.F. magnetron sputtering is studied. The CV in the films (0.41-2.46 at.%) is determined by EDAX analysis. XRD spectra show a preferential c-axis orientation along the (002) plane and average grain size is in the range 19-28 nm. The surface morphology is studied by SEM and AFM. The deposited ZnO:V films have a transmittance value in the visible above 85% and resistivity 1.6-74.10-3 Ω.cm for different CV. The lowest resistivity and better structural properties are observed for the films with CV=1.41 at.%.