Effects of process conditions on nano-dot array formation by thermal dewetting

In this paper, three kinds of self-organization processes for metal nano-dot array fabrication are compared; one is the conventional thermal dewetting, another is thermal dewetting of a grid patterned deposited metal layer, the other is thermal dewetting of a metal layer deposited on a patterned substrate. In these processes, nano plastic forming technique is utilized for patterning of groove grid. Effects of process conditions on nano-dot formation, such as substrate material, deposited metal, thickness of deposited layer, annealing condition, are experimentally studied. Also, effect of grid patterning on improvement of nano-dot array formation is studied. It is shown that grid patterning on a deposited metal layer is effective to improve alignment and configuration of nano-dot array.