کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
179368 459346 2013 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
On the homogenization of the thickness of Cu deposits by means of MHD convection within small dimension cells
موضوعات مرتبط
مهندسی و علوم پایه مهندسی شیمی مهندسی شیمی (عمومی)
پیش نمایش صفحه اول مقاله
On the homogenization of the thickness of Cu deposits by means of MHD convection within small dimension cells
چکیده انگلیسی


• Homogenization of electrochemical deposits by means of MHD convection.
• Analysis of layer thickness along vertical electrodes.
• Relative orientation between Lorentz force and gravity has crucial impact.
• Usage of inhomogeneous magnetic fields is favourable.

The influence of magnetohydrodynamic (MHD) convection on the thickness of an electrochemically deposited copper layer along a vertical plane cathode is examined. A magnetic gradient field, that induces a Lorentz force, establishes a vortical motion of the electrolyte which can be oriented either antiparallel or parallel to the natural convection. For the latter case, we show both experimentally and numerically that a sufficiently strong Lorentz force levels the inhomogeneities of the deposit thickness characteristic for deposition under pure natural convection.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Electrochemistry Communications - Volume 36, November 2013, Pages 80–83
نویسندگان
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