کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1801751 1024576 2010 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Structures and magnetic properties for electrodeposited Co ultrathin films on copper
موضوعات مرتبط
مهندسی و علوم پایه فیزیک و نجوم فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
Structures and magnetic properties for electrodeposited Co ultrathin films on copper
چکیده انگلیسی

The formation of Co films on polycrystalline copper in diluted sulphuric acid was investigated by employing cyclic voltammetry (CV), atomic force microscopy, and in-situ magneto-optic Kerr effect (MOKE) techniques. By comparing CV measurements in the pure supporting electrolyte (11 mM K2SO4/1 mM H2SO4) and the cobalt sulphate solution (10 mM K2SO4/1 mM H2SO4/1 mM CoSO4), peaks from voltammetric cycling for copper dissolution, readsorption of dissolved copper ions, cobalt bulk dissolution and oxidation of hydrogen could be resolved. As the electroplating time increases, the size of the Co clusters increases and the deposition of Co corresponds to island growth. The first hysteresis loop occurs at a Co thickness of 0.33 nm in the longitudinal configuration. For films thinner than 7 nm, the Kerr intensity increases linearly because the Curie temperature of the film is well above 300 K.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Magnetism and Magnetic Materials - Volume 322, Issue 13, July 2010, Pages 1863–1867
نویسندگان
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