Study on the magnetic domain and anisotropy of FeCoSiB amorphous films fabricated by strained growth method

The effect of stress on the magnetic domain and anisotropy of FeCoSiB amorphous films is investigated. It is observed that the unstressed sample consists of irregular domain while the stressed samples show the strip domain. The strip domain of the sample under tensile stress aligns parallel to the direction of the stress while that of the sample under compressive stress aligns perpendicular to it. The variation of the magnetic domain is explained with the magnetoelastic anisotropy induced by the stress, which has been verified by the hysteresis loops, remanences and the anisotropy field. It is also obtained that the stress-induced anisotropy increases with the increase of the stress. The effects of the stress on the magnetic properties of the FeCoSiB films have been discussed.