کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1803227 | 1024613 | 2009 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Effect of oxygen exposure on the magnetic properties of ultrathin Co/Si(1Â 1Â 1)-7Ã7 films
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موضوعات مرتبط
مهندسی و علوم پایه
فیزیک و نجوم
فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Effect of oxygen exposure on the magnetic properties of ultrathin Co/Si(1Â 1Â 1)-7Ã7 films Effect of oxygen exposure on the magnetic properties of ultrathin Co/Si(1Â 1Â 1)-7Ã7 films](/preview/png/1803227.png)
چکیده انگلیسی
Effect of oxygen exposure on the magnetic properties of ultrathin Co/Si(1Â 1Â 1)-7Ã7 films have been studied. In ultrahigh vacuum environment, Auger electron spectroscopy (AES) analysis shows that no oxygen adsorption occurs on Si(1Â 1Â 1)-7Ã7 surface and Co-Si compound interfaces. As the thickness of Co films increases above 5 monolayers (ML), pure cobalt islands form on the surface and the amount of oxygen on the surface layers increases with increasing the oxygen exposure time. From the results of slight chemical shift and depth profiling measurements, the oxygen is weakly adsorbed on the topmost layer of 15Â ML Co/Si(1Â 1Â 1) films. The adsorbed oxygen influences the electronic density of states of Co and leads to the changes of the magnetic properties. The appearance of the O/Co interface could modify the stress anisotropy, as a result, the coercivity of ultrathin Co/Si(1Â 1Â 1) films are enhanced. As an example for 15Â ML Co/Si(1Â 1Â 1), the coercivity increases from 140 to 360Â Oe with 5000Â Langmuir of oxygen exposure.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Magnetism and Magnetic Materials - Volume 321, Issue 16, August 2009, Pages 2398-2401
Journal: Journal of Magnetism and Magnetic Materials - Volume 321, Issue 16, August 2009, Pages 2398-2401
نویسندگان
H.W. Chang, J.S. Tsay, W.Y. Chang, K.T. Huang, Y.D. Yao,