کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1803771 1024629 2008 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Fabrication and characterization of Mn-doped Cu2O thin films grown by RF magnetron sputtering
موضوعات مرتبط
مهندسی و علوم پایه فیزیک و نجوم فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
Fabrication and characterization of Mn-doped Cu2O thin films grown by RF magnetron sputtering
چکیده انگلیسی

Two series of Mn-doped Cu2O diluted-magnetic-semiconductor thin films were prepared by radio-frequency (RF) magnetron sputtering. One is prepared at different deposition temperature with the same Mn doping concentration; the other is deposited at the same temperature but with varying Mn concentration. They were used to find out the ferromagnetic-order zone for the Mn-doped Cu2O systems. Most of the samples show high (1 1 1) orientation, except low doping concentration (<6 at%). No impurities were found by X-ray diffraction and electron diffraction measurement. The doped Mn ions substituted Cu ions in the Cu2O lattice and there were about 1.5% cation vacancies. The grains shown in the transmission electron microscopy (TEM) images for all the samples were tiny, i.e. just 5 nm in diameter. A rough phase diagram for the ferromagnetic order existing in the Mn-doped Cu2O thin films was given with varying Mn doping concentration and deposition temperature.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Magnetism and Magnetic Materials - Volume 320, Issue 23, December 2008, Pages 3303–3306
نویسندگان
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