Effects of well-defined magnetic field gradients on the electrodeposition of copper and bismuth

Paramagnetic Cu2+-ions have been electrodeposited under application of magnetic field gradients. Obtained deposits show a direct correlation of the distribution of magnetic flux density B at the electrode and the deposit thickness and morphology. In contrast to that no influence on the deposit structure has been observed for deposition of Bi from electrolytes containing diamagnetic Bi3+-ions. This indicates that the structuring effect is mainly based on the action of the magnetic gradient force. A structuring-mechanism has been proposed that also discusses influences of the Lorentz force.