کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
180577 459383 2010 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Ordered nanopore boring in silicon: Metal-assisted etching using a self-aligned block copolymer Au nanoparticle template and gravity accelerated etching
موضوعات مرتبط
مهندسی و علوم پایه مهندسی شیمی مهندسی شیمی (عمومی)
پیش نمایش صفحه اول مقاله
Ordered nanopore boring in silicon: Metal-assisted etching using a self-aligned block copolymer Au nanoparticle template and gravity accelerated etching
چکیده انگلیسی

Metal-assisted etching into Si (1 0 0) surfaces can be performed in a highly defined and regular arrangement using self-organized patterns of single-size gold catalyst particles that are block polymer templated on Si surfaces. We show that small size catalyst particles (diameter ≈10 nm) can be forced to maintain straight etch tracks perpendicular to the surface using adequate centrifugal gravity force. This allows the creation of highly ordered uniform and synchronized pore boring into the substrate with single pore diameters in the 10 nm range.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Electrochemistry Communications - Volume 12, Issue 4, April 2010, Pages 565–569
نویسندگان
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