Electrochemical deposition of PbTe onto n-Si(1 0 0) wafers

Electrochemical deposition of PbTe from 50 mM Pb(NO3)2 + 1 mM TeO2 + 0.1 M HNO3 solution onto n-Si(1 0 0) wafers was studied using cyclic voltammetry (CV), chronoamperometry, ex situ SEM, XRD and EDX. Electrochemical behavior of n-Si(1 0 0) electrode in electrolytes 50 mM Pb(NO3)2 + 0.1 M HNO3 and 1 mM TeO2 + 0.1 M HNO3 was also studied. No underpotential deposition (UPD) of Pb and Te onto n-Si was observed in the investigated systems indicating weak Pb–Si and Te–Si interactions. Deposition of Pb and Te on n-Si occurred with overvoltage via 3D island growth. Electrosynthesis of PbTe (NaCl-like structure, a = 0.650 nm) takes place due to codeposition of Pb and Te at potentials E > EPb2+/Pb0 (lead UPD onto tellurium). Cathodic deposition of PbTe onto n-Si(1 0 0) is irreversible – there is no anodic current in the CV curve. Oxidation of PbTe on n-Si is observed only under illumination, when photoelectrons and photoholes are generated in silicon substrate.