کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
182354 459423 2008 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
The impedance related to the electrochemical hydrogen insertion into WO3 films – On the applicability of the diffusion-trapping model
موضوعات مرتبط
مهندسی و علوم پایه مهندسی شیمی مهندسی شیمی (عمومی)
پیش نمایش صفحه اول مقاله
The impedance related to the electrochemical hydrogen insertion into WO3 films – On the applicability of the diffusion-trapping model
چکیده انگلیسی

Impedance analysis of electrochemically prepared WO3 films has been carried out in order to investigate the applicability of the diffusion-trapping model to the analysis of impedance spectra related to electrochemical hydrogen insertion. The impedance spectra measured under different conditions have been analyzed by using CNLS fitting. It has been shown, that the expressions derived for the diffusion-trapping model adequately describe the impedance response of the system. Despite of the great number of adjustable parameters many of them could be determined with a good statistics, and reasonable estimated mean values have been obtained for the others. The reliability of the estimated parameters was checked by comparing the results with existing experimental data.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Electrochemistry Communications - Volume 10, Issue 2, February 2008, Pages 283–287
نویسندگان
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