کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1867488 | 1038285 | 2009 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Fabrication of DLC films by pulsed ion beam ablation in a dense plasma focus device
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موضوعات مرتبط
مهندسی و علوم پایه
فیزیک و نجوم
فیزیک و نجوم (عمومی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
The pulsed intense ion beam, emitted from a dense plasma focus (DPF) discharges performed with hydrogen gas, has been used to ablate the graphite target depositing diamond-like carbon (DLC) films on Si substrates. The substrates were mounted on a holder, which allowed for deposition at positions between normal and 20° off-normal to the target. The samples were removed for analysis after 10 and 20 shots. Nano-particles were observed in the films by a field-emission scanning electron microscope. Raman spectra indicate that sample deposited at 20° off-normal with 20 shots possesses the highest sp3 content among the samples. The film deposited at this position was also found has the highest hardness.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Physics Letters A - Volume 373, Issue 45, 2 November 2009, Pages 4169-4173
Journal: Physics Letters A - Volume 373, Issue 45, 2 November 2009, Pages 4169-4173
نویسندگان
Z.P. Wang, H.R. Yousefi, Y. Nishino, H. Ito, K. Masugata,