TFA-MOD (Metal Organic Deposition Using Trifluoroacetates) Films with Thickness Greater Than 1 Micron by a Single Deposition

The key to obtaining films with thickness greater than 1 micron by a single TFA-MOD deposition is a crack-preventing material. The ratio of fluorine atoms to total fluorine and hydrogen atoms (RF) of the chemical is important for forming excellent superconducting films. Although hydrogen atoms lead to carbon residue, which fatally deteriorates superconducting properties of the resulting film, hydrogen atoms form strong hydrogen bonds with trifluoroacetates and have an excellent crack-prevention effect. The RF range from 0.75 to 0.96 is effective for obtaining single-coated, thick, high-critical-current-density superconducting films.