Picosecond Laser Patterning of ITO Thin Films

We present a comparative study of picosecond laser patterning of ITO thin films for OLED applications using 355 nm, 532 nm and 1064 nm radiation. Front side and rear side patterning was investigated and single pulse ablation thresholds were determined for all three wavelengths and both irradiation sides. Good ablation quality was achieved by using 1064 nm front side irradiation resulting in a smooth groove bottom, almost vanishing ridges at the groove rims and a neglectable heat affected zone.