TL glow curve shape and response of LiF:Mg,Cu,Si—Effect of heating rate

Glow curve structure of a recently developed LiF:Mg,Cu,Si TLD was found to be the same as that of LiF:Mg,Cu,P. In view of the reported effects of heating rate in LiF:Mg,Cu,P TLD, the study on LiF:Mg,Cu,Si was undertaken for its use in personal dosimetry applications. In LiF:Mg,Cu,Si, the thermally isolated main dosimetric peak did not exhibit any reduction in its TL response with increasing heating rate in the range from 1 to 30 °C s−1. In the combined glow curve, the lower temperature peaks exhibited only a marginal impact on the response. However, an increase in the response of a lower temperature peak with increasing heating rate affected the shape of the combined glow curve. For 0.8 mm thick TLDs, heating rate dependent thermal lag resulted in a temperature lag of 62 °C higher than that of 150μm TLD powder grains at 30 °C s−1. With the increase in the heating rate, the full width at half maxima (FWHM) of the isolated main peak increased from 22 to 24.8 °C for the 0.8 mm thick TLDs and from 22.6 to 28.4 °C for the 150μm powder grains. The impact of the effect of heating rate is discussed.