کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1883887 | 1533440 | 2013 | 4 صفحه PDF | دانلود رایگان |

The dependence of thermoluminescence (TL) of LiF:Mg,Cu,Si on sintering temperatures and dopants concentrations were investigated. The dependency of the TL in LiF:Mg,Cu,Si on sintering temperature exhibits a very sharp maximum at 830 °C. LiF:Mg,Cu,Si is much too sensitive than LiF:Mg,Cu,P to sintering temperature. The glow curve and the TL sensitivity depend on the concentration of Mg, Cu and Si, showing a distinct maximum for certain concentrations of these impurities. Mg seems to be the most essential dopant, as very small changes of the Mg content strongly influence both the glow curve and the TL sensitivity. Si is the main activator responsible for TL emission. The stability to heat treatments in LiF:Mg,Cu,Si was influenced greatly by Mg concentrations. The thermal instability in LiF:Mg,Cu,Si is caused not by Cu and Si but Mg ion state change. It was found that the optimum concentrations are Mg:0.6 mol%, Cu:0.03 mol% and Si:0.9 mol% for this material, which showed the best stability to heat treatment.
► LiF:Mg,Cu,Si is much too sensitive than LiF:Mg,Cu,P to sintering temperature.
► The glow curve and the TL sensitivity depend significantly on the concentration of Mg, Cu and Si.
► The stability to heat treatments in LiF:Mg,Cu,Si was influenced greatly by Mg concentrations.
► The thermal instability in LiF:Mg,Cu,Si is caused not by Cu and Si but Mg ion state change.
► The optimum concentrations are Mg:0.6 mol%, Cu:0.03 mol% and Si:0.9 mol% for this material.
Journal: Radiation Measurements - Volume 48, January 2013, Pages 43–46