Numerical solving of the track wall equation in LR115 detectors etched in direct and reverse directions

Our equation of the track wall was solved numerically by using finite difference method and computer software MATHEMATICA. This method was applied for alpha particle tracks in LR115 detector, assuming both directions of etching, from the top and bottom of the sensitive layer. The equation of the track wall etched in reverse direction was derived, and has the same form as one for direct etching, with some difference in argument of V function. We will analyse the consequences of direct and reverse etching on the shape of alpha particles tracks with energies ranging from 2 to 4 MeV in thin LR115 NTDs.