Degradation of amoxicillin in aqueous solution using nanolepidocrocite chips/H2O2/UV: Optimization and kinetics studies

Degradation of amoxicillin (AMX) by nanolepidocrocite chips/H2O2/UV method as a new photo-Fenton like process was investigated and optimized by response surface methodology (RSM). The optimal conditions were initial AMX concentration of 10 mg l−1 and initial H2O2 concentration of 60 mg l−1 at pH of 2 under UV radiation for 120 min. The general photo-Fenton process mechanism was applied to propose a new kinetic model for AMX degradation. According to this model, the reaction constant between AMX and OH was obtained 4.55 × 105 M−1 s−1. Also, nanolepidocrocite showed good catalytic activity even after four successive degradation cycles.

Nanolepidocrocite chips/H2O2/UV as a new photo-Fenton like process was used to degrade amoxicillin (AMX) in aqueous solution and a novel kinetic model was introduced for this process.r=−d[AMX]dt=k1k2k72k3k10[Fetotal3+]×H2O20.5[AMX]where k1, k2, k3, k7, and k10 are rate constant of AMX with OH, Fe2+ with H2O2, Fe2+ with OH, Fe2+with HO2, and OH with HO2 reactions, respectively.Figure optionsDownload as PowerPoint slide