کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
237208 | 465698 | 2012 | 13 صفحه PDF | دانلود رایگان |
![عکس صفحه اول مقاله: Functionalization of fine particles using atomic and molecular layer deposition Functionalization of fine particles using atomic and molecular layer deposition](/preview/png/237208.png)
The functionalization of fine primary particles, including nanoparticles and nanotubes, is easily carried out using atomic or molecular layer deposition (ALD or MLD, respectively) techniques. Particle ALD/MLD can be used to deposit conformal and pinhole-free films of refractory oxides, non-oxides, metals, and hybrid polymer-based materials, amongst others. Fluidized bed reactors are well-suited for large scale operations and can be operated at reduced pressures while using inert gases necessary for standard self-limiting, flow-based ALD/MLD processes. The continuous-flow processing allows for process control using an in-line mass spectrometer downstream from the reactor chamber. Many insulating, semiconducting, metallic, polymeric and hybrid inorganic/organic films have been successfully deposited on primary particle surfaces in fluidized bed reactors using a variety of precursor types. This paper reviews some of the Particle ALD/MLD work carried out by the authors, including techniques and measurements used in Particle ALD/MLD. Some current and future applications of functionalized or passivated nanomaterials are also highlighted here.
This paper is a review of the functionalization of fine primary particles, including nanoparticles, as carried out using atomic or molecular layer deposition (ALD or MLD, respectively). Particle ALD/MLD can be used to deposit conformal and pinhole-free films of refractory oxides, non-oxides, metals, and hybrid polymer-based materials, amongst others. Scalable fluidized bed reactors are well-suited for large scale ALD/MLD processing.Figure optionsDownload as PowerPoint slide
Journal: Powder Technology - Volume 221, May 2012, Pages 13–25