Monolithic integration of a InP AWG and InGaAs photodiodes on InP platform

We demonstrate a monolithic integration of a photodiode array and a 13 channels arrayed waveguide grating (AWG) grown on InP substrate with a shallow trench structure between the AWG top cladding layer and the photodiode p-doped layer. A smooth epitaxial structure interface is obtained by nonselective regrowth to make the two epitaxial structure compatible and fabrication easy. Three-dimensional finite-difference time-domain(FDTD) solutions are used in the optical simulations. The highest simulation quantum efficiency can achieve 82%. The fabricated PD with a trench structure presents a responsivity of 0.68 A/W. The integrated device can achieve a total capacity of more than 200 Gb/s.