Wafer-scale fabrication of conformal atomic-layered TiO2 by atomic layer deposition using tetrakis (dimethylamino) titanium and H2O precursors

Wafer-scale fabrication of conformal atomic-layered TiO2 by atomic layer deposition using tetrakis (dimethylamino) titanium and H2O precursors

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials & Design - Volume 120, 15 April 2017, Pages 99-108

Serge Zhuiykov, Mohammad Karbalaei Akbari, Zhenyin Hai, Chenyang Xue, Hongyan Xu, Lachlan Hyde,