Ultra-low reflection CuO nanowire array in-situ grown on copper sheet

The ultra-low reflection CuO/Cu material in UV-vis range is successfully designed and achieved, via orderly growing ultralong CuO nanowires to construct the thick and vertically aligned array. The blackest sample obtains anultra-low reflectance of 0.078% in 200-700 nm region. The preparation method of the above ultra-low reflection material is suitable for industrial production.169