کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
537950 870946 2010 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Effect of sputtering condition on the surface properties of silicon oxide thin films prepared for liquid crystal alignment layers
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Effect of sputtering condition on the surface properties of silicon oxide thin films prepared for liquid crystal alignment layers
چکیده انگلیسی

SiOx thin films are widely used for the LC alignment layer for LCoS devices due to the thermal and photochemical stability of SiOx. In this work, the relationship between the sputtering condition and the LC alignment properties of SiOx thin films was studied. The physical and chemical properties of SiOx thin films were closely related with the RF power and the working pressure of RF-magnetron sputtering. The surface energy of SiOx thin films was mainly connected with the chemical composition of the SiOx thin films and the behavior of LC molecules on the SiOx thin films was dominantly affected by the surface energy. The azimuthal anchoring energy and the pretilt angle of LC molecules were changed by modifying the amount of oxygen atom in the SiOx thin films. By controlling the sputtering condition of SiOx thin films, it was possible to control the orientation of LC molecules on the SiOx thin films.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Displays - Volume 31, Issue 2, April 2010, Pages 93–98
نویسندگان
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