کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5430641 | 1508714 | 2006 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Discrete Sources Method for analysis of a light scattering by an air bubble on resist for immersion lithography
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موضوعات مرتبط
مهندسی و علوم پایه
شیمی
طیف سنجی
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چکیده انگلیسی
The discrete sources method (DSM) is applied to calculate light scattering by a half-spherical bubble in water on a substrate. For the first time an algorithm which allows the near-field calculation on the base of DSM is presented. Such investigations are important in immersion lithography, as the presence of bubbles on a resist surface decreases image quality. On the base of DSM the numerical algorithm of the near-field calculation is realized. Numerical results for the near-field inside the resist for different depths under the surface are presented.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Quantitative Spectroscopy and Radiative Transfer - Volume 100, Issues 1â3, JulyâAugust 2006, Pages 131-136
Journal: Journal of Quantitative Spectroscopy and Radiative Transfer - Volume 100, Issues 1â3, JulyâAugust 2006, Pages 131-136
نویسندگان
Elena Eremina, Thomas Wriedt, Yuri Eremin,