کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5490595 1524793 2017 17 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
RF magnetron sputtering deposition of NiO/Ni bilayer and approach of the Magnetic behavior using the Preisach model
موضوعات مرتبط
مهندسی و علوم پایه فیزیک و نجوم فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
RF magnetron sputtering deposition of NiO/Ni bilayer and approach of the Magnetic behavior using the Preisach model
چکیده انگلیسی
Bilayer of nickel and nickel oxide were deposited on glass substrates using RF magnetron sputtering technique. The magnetic properties of the prepared thin films were carried out at room temperature in both parallel and perpendicular magnetic field to the sample. The Preisach model was applied to provide a mathematical model of the magnetic hysteresis loop in the case of parallel geometry, along the easy axis of the bi-layer NiO / Ni. Good agreement was obtained between the theoretical and experimental results.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Magnetism and Magnetic Materials - Volume 428, 15 April 2017, Pages 377-381
نویسندگان
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