کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5497340 | 1530941 | 2016 | 10 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Selective Ablation of thin Nickel-chromium-alloy Films Using Ultrashort Pulsed Laser
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موضوعات مرتبط
مهندسی و علوم پایه
فیزیک و نجوم
فیزیک و نجوم (عمومی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Selective Ablation of thin Nickel-chromium-alloy Films Using Ultrashort Pulsed Laser Selective Ablation of thin Nickel-chromium-alloy Films Using Ultrashort Pulsed Laser](/preview/png/5497340.png)
چکیده انگلیسی
The selective ablation of 100nm thin Nickel-Chromium-alloy films on glass substrate was investigated using femtosecond laser pulses (λ=1030nm, Ïp=170 fs, Ep,max=7μJ). The influence of the processing parameters such as fluence, pulse number and pulse repetition rate on the ablation process was examined. Single and multiple pulses ablation thresholds of the Nickel-Chromium-alloy film were determined and the incubation coefficient calculated. Optical and electron microscopy were employed to characterize the patterned area. As a result, different irradiation morphologies were observed, dependent from the processing parameters. A processing window for film side ablation of the Nickel-Chromium-alloy film without damaging the underlying glass substrate was found, however, the edge of the ablation craters were covered with laser induced periodic surface structures (LIPSS).
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Physics Procedia - Volume 83, 2016, Pages 104-113
Journal: Physics Procedia - Volume 83, 2016, Pages 104-113
نویسندگان
Linda Pabst, Robby Ebert, Horst Exner,