کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
612911 880710 2006 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Adsorption behavior and activity of hexokinase
موضوعات مرتبط
مهندسی و علوم پایه مهندسی شیمی شیمی کلوئیدی و سطحی
پیش نمایش صفحه اول مقاله
Adsorption behavior and activity of hexokinase
چکیده انگلیسی

The study on the adsorption of hexokinase (HK) onto silicon wafers was carried out by means of in situ ellipsometry and atomic force microscopy in the liquid. The thickness values of the adsorbed HK layer determined by both techniques were in excellent agreement and evidenced HK monolayer formation. The adsorption of HK onto Si wafers was favored at low ionic strength, indicating that the adsorption is mainly driven by electrostatic forces, since salt screens not only the segment–segment repulsion but also the segment–surface attraction when the salt concentration increases. The enzymatic activity of free HK and of adsorbed HK was measured as a function of time. Free HK in solution lost activity upon storage. Contrarily, adsorbed HK kept its activity level even after 48 h storage at room temperature. This outstanding behavior was attributed to specific orientation of the HK active site to the solution.

AFM in the liquid and in situ ellipsometry evidenced the formation of a smooth HK monolayer on Si wafers. Upon storing free HK lost activity, while immobilized HK kept enzymatic activity.Figure optionsDownload as PowerPoint slide

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Colloid and Interface Science - Volume 302, Issue 2, 15 October 2006, Pages 417–423
نویسندگان
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