کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
6601314 | 459332 | 2014 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Electrochemical properties of stoichiometric RuN film prepared by rf-magnetron sputtering: A preliminary study
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی شیمی
مهندسی شیمی (عمومی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Electrochemical properties of stoichiometric RuN film prepared by rf-magnetron sputtering: A preliminary study Electrochemical properties of stoichiometric RuN film prepared by rf-magnetron sputtering: A preliminary study](/preview/png/6601314.png)
چکیده انگلیسی
The electrochemical properties and stability of ruthenium mononitride (RuN) thin films were studied. Coatings of RuN were synthesized on electropolished titanium supports by rf-magnetron sputtering. RuN electrodes appear rather stable against dissolution, independently of pH, but show to possess the greatest stability only in alkaline environment. Under hydrogen evolution conditions the films show relevant catalytic properties, comparable with Pt, Pd and Ru/Ir derivatives; a significant coverage by adsorbed reaction intermediates is involved. These electrodes are of potential application in energetics and sensoring.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Electrochemistry Communications - Volume 49, December 2014, Pages 9-13
Journal: Electrochemistry Communications - Volume 49, December 2014, Pages 9-13
نویسندگان
Davide Rosestolato, Giancarlo Battaglin, Sergio Ferro,