Colloidal lithography using silica particles: Improved particle distribution and tunable wetting properties

► Colloidal lithography is used to modify large surface areas at the nanoscale level. ► Aggregate formation occurs at the drying step if large hydrophilic colloids are used. ► Aggregation is avoided when a macromolecular layer is adsorbed on the colloids. ► Obtained surfaces are hydrophobic and switch to very hydrophilic when calcinated.